TEW GROUP LITERATURE
Monday, February 11, 2008
J. Mater. Chem., 2008, 18, 560 - 566
Novel base-sensitive polymers generating amino groups from their side chains in a nonlinear manner and their application to photoimaging materials
Akira Igarashi, Koji Arimitsu, Takahiro Sekic and Kunihiro Ichimura
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