TEW GROUP LITERATURE
Tuesday, June 10, 2008
Advanced Materials
Hierarchical Self-Assembly of Block Copolymers for Lithography-Free Nanopatterning
Bong Hoon Kim
1
, Dong Ok Shin
1
, Seong-Jun Jeong
1
, Chong Min Koo
2
, Sang Chul Jeon
3
, Wook Jung Hwang
3
, Sumi Lee
4
, Moon Gyu Lee
4
, Sang Ouk Kim
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