TEW GROUP LITERATURE
Friday, March 20, 2009
Macromol. Chem. Phys. , Vol 210, Iss 5, 2009
Thiyl Radical Generation in Thiol or Disulfide Containing Photosensitive System
Jacques Lalevée, Fabrice Morlet-Savary, Mohamad El Roz, Xavier Allonas, Jean Pierre Fouassier
p 311-319
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