Programmable Soft Lithography: Solvent-Assisted Nanoscale Embossing
Min Hyung Lee†, Mark D. Huntington‡, Wei Zhou‡, Jiun-Chan Yang†, and Teri W. Odom*†‡
†Department of Chemistry and ‡Department of Materials Science and Engineering, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States
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