All-Water-Based Electron-Beam Lithography Using Silk as a Resist.
Kim, Sunghwan, Benedetto Marelli, Mark A. Brenckle, Alexander N. Mitropoulos, Eun-Seok Gil, Konstantinos Tsioris, Hu Tao, David L. Kaplan, and Fiorenzo G. Omenetto.
Nature Nanotechnology 9 (4): 306–10.
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